Silicon and LTCC Processes

o Luis da Silva Zambom, Ronaldo Domingues Mansano and Rogerio Furlan, “Silicon Nitride Deposited by Inductively Coupled Plasma using Silane and Nitrogen”, Vacuum 65 (2002), pp. 213-220.

 

o Luis da Silva Zambom, Ronaldo Domingues Mansano, Rogerio Furlan, and Patrick Bernard Verdonck, "LPCVD deposition of silicon nitride assisted by high density plasmas", Thin Solid Films, Volumes 343 - 344, 1999, pp. 299 - 301.

 

o Rogerio Furlan, Jan Van der Spiegel and Jacobus Willibrordus Swart, "Study of the thermal stability of the Al/TiW/TiSi2/Si structure", Journal of the Electrochemical Society, vol.138, n. 8, 1991, pp.2377 - 2381.

 

o Rogerio Furlan and Jacobus Willibrordus Swart, "Titanium silicide formation and arsenic dopant behavior under rapid thermal treatments in vacuum", Journal of the Electrochemical Society, vol.136, n. 6, 1989, pp.1806 - 1811.

 

· Ronaldo W. Reis, Sebastião G. dos Santos Filho, Ioshiaki Doi, Rogerio Furlan, "Carbon outdiffusion from Ni(C)/Pt/Si structures during nickel silicide formationby rapid thermal annealing", Proceedings of the ECS Transactions - Microelectronics Technology and Devices - SBMicro 2006, Ouro Preto, MG, Brazil, vol. 4, 2006, pp. 503-511.

 

· Luís da Silva Zambom, Ronaldo Domingues Mansano and Rogerio Furlan, "Characteristics of silicon nitride films deposited by inductively coupled plasma CVD", Proceedings of the XV International Conference on Microelectronics and Packaging (SBMicro 2000), Manaus, AM, pp. 315-318.

 

· Luís da Silva Zambom, Ronaldo Domingues Mansano and Rogerio Furlan, “Silicon nitride coupled plasma deposited from mixtures of silane-nitrogen and silane ammonia”, International Conference on Microelectronics and Packaging ICMP'99, Campinas, SP, Brazil, 1999, pp. 286-288.

 

· Eliphas Wagner Simoes, Rogerio Furlan and Jorge J. Santiago-Aviles, "The formation of cobalt silicide in two thermal stages", Proceedings of The Fourteenth International VLSI Multilevel Interconnection Conference (VMIC), Santa Clara, CA, 1997, pp. 268

 

· Ana Neilde Rodrigues da Silva, Rogerio Furlan and Jorge J. Santiago-Aviles, "Substrate influence on the formation of titanium silicide on polycristaline silicon", Materials Research Society Symposium Proceedings, Vol. 402, Silicide Thin Films - Fabrication, Properties and Applications, Edited by Raymond T. Tung, Karen Maex, Paul W. Pellegrini and Leslie H. Allen, 1996, pp. 119 - 124.

 

· Ana Neilde Rodrigues da Silva, Rogerio Furlan and Jorge J. Santiago-Aviles, "Formation of titanium silicide strap lines by the deposition of a double layer of amorphous silicon - titanium", Materials Research Society Symposium Proceedings, Vol. 402, Silicide Thin Films - Fabrication, Properties and Applications, Edited by Raymond T. Tung, Karen Maex, Paul W. Pellegrini and Leslie H. Allen, 1996, pp. 125 - 129.

 

· Marcelo Bariatto Andrade Fontes, Juan Carlos Aquadro Quacchia, Rogerio Furlan and Jorge Juan Santiago-Aviles, "Rapid titanium silicidation: a comparative study of two reactors", Materials Research Society Symposium Proceedings, Spring Meeting, San Francisco, Califórnia, vol. 303 - Rapid Thermal and Integrated Processing II, 1993, pp.95-101.

 

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